A2 beamline receives half of the X-ray beam from the 5.3 GeV e- beam passing through the 49 pole wiggler. High flux, wide energy range of up to 60 KeV, and flexible crystal and multilayer optics make possible variety of experiments in diverse areas of material science and solid state physics.
A2 Users Science includes (but not limited to):
A2 Schematic
| A2 Station Summary | ||
| Source: | Number of Poles | 49 |
| Period (cm) | 12 | |
| Peak Magnetic Field (T) | 0.8 | |
| Critical Energy, (keV)@5.3GeV | 14.9 | |
| Deflection Parameter, K | 9 | |
| Length, m | 3 | |
| Source size: | FWHM (horizontal) = 3.61 mm, FWHM (vertical) = 1.07 mm | |
| Distance to source: | 35.5 m to center of A2 hutch | |
| Beam Position Monitors (BPM): | ||
| Photoelectron Monitor (PE) | 21m from the source | |
| Diode BPM | 26.4 m | |
| Video Beam Position Monitor (VBPM) | 26.5 m | |
| Filters and Windows: | ||
| Graphite Filter | 0.762 mm | |
| Total Thickness of Be Windows | 3.1 mm | |
| Mirror: | ||
| Rh coated, electroless-nickel-plated Glidcop | ||
| 600 mm x 80 mm x 80 mm | ||
| bendable (vertical focusing) | ||
| Monochromator: | ||
| Double-bounce upward, offset: 20 to 40 mm | ||
| Operates in vacuum (10-8 torr) | ||
| Can accommodate both crystals and multilayers | ||
| Graphite filter with thickness 0-24 mm in front of 1st crystal | ||
| Standard Monochromator Optics: | |||
| Crystals: | |||
| 1st crystal | 2nd crystal | Energy Range, keV | |
| flat 75mm x 50mm Si(111) | flat 75mm x 50mm Si(111) | 7-50 | |
| flat 75mm x 50mm Si(111) | sagittal Si(111) | 7-22 | |
| Multilayers: | ||||
| d-spacing, Å | Material | Substrate | Refl | ΔE/E,% |
| 15 | Mo/B4C | 200x50x10mm,flat; SiC | 0.4 | 0.3 |
| Mo/B4C | 200x50x10mm,flat; Si | 0.4 | 0.3 | |
| W/B4C | 200x50x25mm,curved; Si | 0.5 | 0.5 | |
| 20 | Mo/B4C | 200x50x10mm,flat; SiC | 0.65 | 0.6 |
| Mo/B4C | 200x50x10mm,flat; Si | 0.65 | 0.6 | |
| W/B4C | 200x50x25mm,curved; Si | 0.65 | 0.8 | |
| 28 | W/B4C | 200x50x25mm, SiC | 0.8 | 1.9 |
| W/B4C | 200x50x25mm, Si | 0.8 | 1.9 | |
| W/B4C | 200x50x25mm,curved; Si | 0.8 | 1.9 | |
| Optical table - used to assemble slits, ion chambers, He-flight tubes, additional optics (channel-cut crystals, capillary, shutters, translation stages, auxiliary equipment). | ||||
| Huber four-circle diffractometer - used for general X-ray diffraction and scattering, microbeam diffraction, X-ray Standing Wave and other techniques; equipped with high count rate Bede scintillation detector; linear and 2D detectors (available upon request) can be also mounted on 2-th detector arm. | ||||
| Additional optics - double-bounce and three-bounce Si and Ge channel-cut crystals; miniature double-bounce Si and Ge channel-cuts for high angular resolution microbeam experiments. | ||||
| Detectors - MAR345, CCD, XFlash and other Si and Ge energy-dispersive detectors are available on request. | ||||
