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High energy XRD-XRF for
high-throughput analysis of compositional spread thin films | |||
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Goal: high throughput analysis of compositional spread thin films
Technique: powder diffraction, fluorescence;
Beamline optics: Si(111) at 60 keV
Experimental setup at the CHESS A2 station: Si wafer with a spread film on its surface is mounted on 4-circle diffractometer and diffraction pattern is recorded by MAR-345 detector for each position simultaneously with fluorescence spectrum.
Typical fluorescence spectra
(left) and compositional map (right).
MAR-345 diffraction image (left) and diffraction pattern (right) recorded for one of the spatial positions.
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